D2S, Inc.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 6652
 
  
 
G06F ELECTRIC DIGITAL DATA PROCESSING 48399
 
  
 
H01J ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS 21107
 
  
 
B82Y SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES1043
 
  
 
G03C PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES 541
 
  
 
G21K TECHNIQUES FOR HANDLING PARTICLES OR ELECTROMAGNETIC RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA- OR X-RAY MICROSCOPES 541
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 2360
 
  
 
G06K RECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS 1197
 
  
 
G08B SIGNALLING OR CALLING SYSTEMS; ORDER TELEGRAPHS; ALARM SYSTEMS 193

Top Patents (by citation)

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Recent Publications

Publication # Title Filing Date Pub Date Intl Class
2017/0213,698 Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern DosageApr 07, 17Jul 27, 17[H01J, G06F, G03F]

Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9859100 Method and system for dimensional uniformity using charged particle beam lithographyMay 17, 16Jan 02, 18[H01J, G03F]
9715169 Method and system for forming a pattern on a reticle using charged particle beam lithographyMay 17, 16Jul 25, 17[H01J, G06F, G03F]
9625809 Method and system for forming patterns using charged particle beam lithography with variable pattern dosageJun 16, 16Apr 18, 17[H01J, B82Y, G06F, G03F]
9612530 Method and system for design of enhanced edge slope patterns for charged particle beam lithographyMar 11, 16Apr 04, 17[G06F, G03F]
9465297 Method and system for forming patterns with charged particle beam lithographyMay 18, 15Oct 11, 16[H01J, H01L, B82Y, G06F, G03F]
9448473 Method for fracturing and forming a pattern using shaped beam charged particle beam lithographyDec 15, 15Sep 20, 16[H01J, B82Y, G06F, G03F]
9424372 System and method for data path handling, shot count minimization, and proximity effects correction related to mask writing processMar 15, 13Aug 23, 16[G06F, G03F]
9400857 Method and system for forming patterns using charged particle beam lithographyApr 15, 13Jul 26, 16[G06F, G03F]
9372391 Method and system for forming patterns using charged particle beam lithography with variable pattern dosageJul 25, 15Jun 21, 16[H01J, B82Y, G06F, G03F]
9341936 Method and system for forming a pattern on a reticle using charged particle beam lithographyFeb 11, 14May 17, 16[H01J, G06F, G03F]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2017/0023,862 METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedOct 08, 16Jan 26, 17[H01J, G03F]
2014/0353,526 METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedAug 07, 14Dec 04, 14[H01J, G06F]
2014/0129,997 METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedMar 13, 13May 08, 14[G06F]
2014/0011,124 METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITINGAbandonedSep 09, 13Jan 09, 14[G06F, G03F]
2013/0283,217 METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedApr 15, 13Oct 24, 13[G06F]
2013/0252,143 METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedMay 14, 13Sep 26, 13[G06F]
2013/0070,222 Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical LithographyAbandonedSep 19, 11Mar 21, 13[G03B]
2013/0022,929 METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING SHAPED CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedSep 29, 12Jan 24, 13[G21K, G03F]
2012/0278,770 METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHYAbandonedMar 24, 12Nov 01, 12[G06F]
2012/0217,421 METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH OVERLAPPING SHOTSAbandonedDec 18, 11Aug 30, 12[H01L, A61N, G03F]
2012/0219,886 METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGEAbandonedDec 18, 11Aug 30, 12[H01L, A61N, G03F]
2012/0221,980 METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedFeb 28, 11Aug 30, 12[G06F]
2012/0221,985 METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedFeb 28, 11Aug 30, 12[G06F]
2012/0128,228 Method for Matching of PatternsAbandonedNov 17, 11May 24, 12[G06K]
2011/0265,049 METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITINGAbandonedJul 01, 11Oct 27, 11[G06F]
8039176 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithographyExpiredNov 14, 09Oct 18, 11[G06F, G03F]
7985514 Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shotsExpiredOct 21, 09Jul 26, 11[G06F, G03F]
2011/0089,345 METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHYAbandonedOct 05, 10Apr 21, 11[G21G, G21K]
2010/0229,148 METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITINGAbandonedMay 18, 10Sep 09, 10[G06F]
7579606 Method and system for logic design for cell projection particle beam lithographyExpiredDec 01, 06Aug 25, 09[G21K, G06F]

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